simultaneous thermal analysis–mass spectrometry system sta 409pc-qms 403c (NETZSCH)
90
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NETZSCH
simultaneous thermal analysis–mass spectrometry system sta 409pc-qms 403c
Simultaneous Thermal Analysis–Mass Spectrometry System Sta 409pc Qms 403c, supplied by NETZSCH, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/simultaneous+thermal+analysis%E2%80%93mass+spectrometry+system+sta+409pc-qms+403c/dsc+204/10__1016_slash_j__mseb__2025__118254-46-9-18
Average 90 stars, based on 1 article reviews
Simultaneous Thermal Analysis–Mass Spectrometry System Sta 409pc Qms 403c, supplied by NETZSCH, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
https://www.bioz.com/product/simultaneous+thermal+analysis%E2%80%93mass+spectrometry+system+sta+409pc-qms+403c/dsc+204/10__1016_slash_j__mseb__2025__118254-46-9-18
Average 90 stars, based on 1 article reviews
simultaneous thermal analysis–mass spectrometry system sta 409pc-qms 403c - by Bioz Stars,
2026-09
90/100 stars
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Differential Scanning Calorimetry:Article Title: CF4/Ar/O2 plasma etching behaviour of high-density YOF–Y7O6F9 ceramics fabricated by hot-pressing method Article Snippet: In this study, a YOF and Y7O6F9 composite crystal-phase sintered ceramics with excellent corrosion resistance to fluorine plasma during a semiconductor etching process was fabricated using a hot-pressing sintering process.. The crystal-phase and bonding state of the sintered ceramics were analysed using X-ray diffraction and X-ray photoelectron spectroscopy.. Further, the corrosion resistance was evaluated in terms of the etching depth and rate of the sintered ceramics under CF4 plasma exposure. Synthesized:Article Title: CF4/Ar/O2 plasma etching behaviour of high-density YOF–Y7O6F9 ceramics fabricated by hot-pressing method Article Snippet: In this study, a YOF and Y7O6F9 composite crystal-phase sintered ceramics with excellent corrosion resistance to fluorine plasma during a semiconductor etching process was fabricated using a hot-pressing sintering process.. The crystal-phase and bonding state of the sintered ceramics were analysed using X-ray diffraction and X-ray photoelectron spectroscopy.. Further, the corrosion resistance was evaluated in terms of the etching depth and rate of the sintered ceramics under CF4 plasma exposure. |